3 edition of 2002 7th International Symposium on Plasma- and Process-Induced Damage found in the catalog.
2002 7th International Symposium on Plasma- and Process-Induced Damage
International Symposium on Plasma Process-Induced Damage (7th 2002 Maui, Hawaii)
|Other titles||P²ID, Plasma- and process-induced damage, Plasma process induced-damage|
|Statement||Terence Hook, Koji Eriguchi, and Calvin T. Gabriel, editors ; technical co-sponsors, AVS, IEEE/Electron Devices Society, Japanese Society of Applied Physics.|
|Contributions||Hook, Terence., Eriguchi, Koji., Gabriel, Calvin T., American Vacuum Society., IEEE Electron Devices Society., Ōyō Butsuri Gakkai.|
|LC Classifications||TK7871.85 .I5834 2002|
|The Physical Object|
|Pagination||, i, 177 p. :|
|Number of Pages||177|
|ISBN 10||0965157776, 0965157784|
|LC Control Number||2003268804|
Invited Journal Papers. 1. Invited Paper, M.M.R. Howlader, P.R. Selvaganapathy, M.J. Deen and T. Suga, “Nanobonding Technology Toward Electronic,Fluidic and Photonic Systems Integration,” IEEE Journal of Selected Topics in Quantum Electronics, Available on-line, Vol. 17(3), pp. (May/June ) 2. Invited Review Paper, Farseem M. Mohammedy and M. Jamal Deen, . The automated fiber placement process (AFP) enables the manufacturing of large and geometrical complex fiber composite structures with high quality at low cycle times. Although the AFP process is highly accurate and reproducible, manufacturing induced imperfections in the produced composite structure occur. This review summarizes and classifies typical AFP Cited by: 1.
International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings International Symposium on Technology and Society, Proceedings Proceedings of the ACM SIGSOFT International Symposium on Software Testing and Analysis Proceedings of the ACM SIGPLAN Workshop on Rule-Based Programming. 5TH INTERNATIONAL SYMPOSIUM ON PLASMA PROCESS-INDUCED DAMAGE, 5th International Symposium on Plasma Process-Induced Damage (P2ID) DOI Author Url. Sii HK, Zhang JF, Degraeve R, Groeseneken G.
Sergey Zaytsev, Walter Blondel, Marine Amouroux, Grégoire Khairallah, Alexey Bashkatov, Valery Tuchin, Elina Genina Proc. SPIE. , Saratov Fall Meeting Optical and Nano-Technologies for Biology and Medicine. in Proceedings of IEEE International Electron Devices Meeting - IEDM, International Symposium on Technology Evolution for Silicon Nano-Electronics - ISTESNE, Washington, DC USA, Tokyo Japan, Thijs S., Tremouilles D., Linten D., Mahadeva Iyer R., Griffoni A., Groeseneken G., " Advanced ESD power clamp design for SOI FinFET CMOS technology.".
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Get this from a library. 7th International Symposium on Plasma- and Process-Induced Damage: June, Maui, Hawaii, USA. [Terence Hook; Koji Eriguchi; Calvin T Gabriel; American Vacuum Society.; IEEE Electron Devices Society.; Ōyō Butsuri Gakkai.;].
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In: 31st European Microwave Conference,SeptemberLondon, UK. Proc. SPIE.Pacific Rim Laser Damage Optical Materials for High-Power Lasers KEYWORDS: Image processing algorithms and systems, Optical components, Detection and tracking algorithms, Image segmentation, Image processing, Laser induced damage, High power lasers, Image quality, Standards development, Algorithms.
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Viswanathan, “Plasma Process Induced Abnormal 1/f Noise Behavior in Deep Sub-Micron MOSFETs”, 3 rd International Symposium on Plasma Process-Induced Damage (P2ID), Hawaii, USA, June.
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